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利用者:きたし/optics

至急[編集]

急[編集]

A[編集]

B[編集]

C[編集]

D[編集]

  • ダゴール Dagors, 455, 516
  • ダール・カーカム Dall-Kirkham system, 481
  • Damped least squares, 434
  • 暗順応 Dark adaptation, 131–132
  • 密度 Density:
    • of optical glass, 181
    • in transmission calculations, 175
  • Depolarizers, 200
  • 被写界深度 Depth of field, 154
  • 焦点深度 Depth of focus, 154–157, 348
  • 正立プリズム Derotation prisms, 112
  • 検出器光学 Detector optics, 274–281
  • Deviation:
    • in centering, 565–566
    • in prisms, 91–92, 94
  • Dialyte achromats, 411
  • Diamond turning, 414, 483, 559
  • ダイクロイック Dichroics, 210
  • 双極子反射 Dielectric reflection, 200–209
  • 回折 Diffraction, 11–16
    • of apertures, 157–160
    • of gaussian beams, 163–168
  • Diffraction efficiency, 413–414
  • 回折格子 Diffraction grating, 163
  • 回折限界 Diffraction-limited systems, 376–383, 492
  • Diffractive surfaces, 296–297, 413
    • achromatic diffractive singlets, 415–417
    • apochromatic diffractive doublets, 417–418
    • diffraction efficiency in, 413–414
    • manufacturability of, 414
    • Sweatt model for, 414–415
  • Diffuse sources, irradiance from, 223–225
  • Diffusing materials, 195–198
  • Dimensions for prisms, 567–568
  • 視度調整 Diopter adjustments, 445
  • Diopter gages, 598
  • 直視プリズム Direct vision prisms, 94–96
  • Direction cosines, 308–311
  • 分散プリズム Dispersing prisms, 91–92
  • 歪曲 (光学) Distortion, 71–72, 76–77, 79
    • keystone, 56–57
  • Dogmar anastigmats, 462, 464, 517
  • Double-Gauss designs:
  • ドーブプリズム Dove prisms, 105–107
  • Dutch telescopes, 252

E[編集]

  • Effective clear aperture, 257–258
  • 有効焦点距離→焦点距離 Effective focal length (efl), 23
  • Element shape solutions, 421–422
  • Emissivity, 235–237
  • Empty magnification, 258
  • Endoscopes, 256–257
  • 引き伸ばしレンズ Enlarger lenses, 464
  • 入射瞳 Entrance pupils, 52, 142, 254
  • 入射窓 Entrance windows, 143
  • Equiconcave and equiconvex elements, 436
  • Equivalent air paths, 257
  • Equivalent air thickness, 101
  • Erecting prism systems, 108–111
  • Erecting telescopes, 252, 254, 445
  • エルフレ Erfle eyepieces, 444, 510
  • 射出瞳 Exit pupils, 142
    • in magnifiers, 444
    • in optical devices, 257–267
    • in telescopes, 254, 260
  • 射出窓 Exit windows, 143
  • Express lenses, 455
  • Extended objects, 21
  • アイリリーフ、アイレリーフ、アイポイント→接眼レンズ Eye relief, 254–255
  • Eyelenses:
    • in microscopes, 269
    • in telescopes, 252–254
  • 眼 Eyes, 125–126
    • 光学設計における in optical design, 257–267
    • 感度 sensitivity of, 131–134
    • 構造 structure of, 126–128
    • visual acuity of, 128–130

F[編集]

G[編集]

  • G-sums, 339
  • Gain of projection screens, 197
  • Gaussian beams, diffraction of, 163–168
  • Gaussian optics, 22
  • ゼラチンフィルター→光学フィルタ、レンズフィルタGelatin filters, 193
  • General and skew ray computations:
    • aspheric surfaces, 312–317
    • spherical surfaces, 308–312
  • Generating process, 550
  • Geneva lens gages, 598
  • Geometric image energy distribution, 360–361
  • Geometric spot size, 362–366
  • Geometrical modulation transfer factor, 496
  • 迷光絞り Glare stops, 147–148
  • Glass molding, 483–484
  • Goerz Dagors, 455
  • Goerz prisms, 111–112
  • Gradient index fibers, 285–286
  • Gradient index glasses, 187
  • Gray-bodies, 235
  • Green optical glass filters, 193
  • グレゴリー式望遠鏡 Gregorian telescopic system, 477–480
  • →光学部品研磨 Grinding, 552–554, 556

H[編集]

  • Half-field angles in radiometers, 277
  • →分散公式 Hartmann dispersion equation, 176–177
  • Heat-absorbing glasses, 194
  • Hektor anastigmats, 460–461
  • Heliar anastigmats, 460, 520
  • Hemispheres, radiation into, 222–223
  • Herzberger dispersion equation, 176–177
  • High-power microscope objectives, 450–451, 530
  • High-speed processing, 556
  • Higher-efficiency coating, 205
  • Higher-order aberrations, 88
  • Hot mirrors, 210
  • Hyperfocal distance, 156
  • Hypergon lenses, 401

I[編集]

  • Illumination:
    • and apertures, 151–154
    • of natural sources, 239–240
    • in photometry, 240–242
    • units for, 239
    • in visual acuity, 129–131
  • Illumination devices:
    • integrating spheres, 247–248
    • light pipes in, 281
    • projection condensers, 245–247
    • searchlights, 243–245
    • telescope brightness, 247
  • Image evaluation, 347
    • geometric spot size, 362–366
    • image energy distribution, 360–361
    • modulation transfer function, 366–372
      • computation of, 372–376
      • diffraction-limited systems, 376–383
    • optical path difference, 348–355
    • point spread functions for, 385–391
    • radial energy distribution, 383–385
    • spread functions for, 361–362
    • tolerances in, 355–360
  • Image formation, 21–22
    • cardinal points in, 22–24
    • focal points and principal points in, 39–42
    • light ray refraction in, 30–32
    • matrix optics in, 54–55
    • mirrors in, 43–45
    • optical invariant in, 49–54
    • paraxial raytracing in, 34–38
    • paraxial region in, 32–34
    • position in, 24–26
    • Scheimpflug condition in, 55–57
    • separated component systems in, 45–49
    • sign conventions in, 57–58
    • size in, 26–30
    • thin lenses in, 42–43
    • y-ybar diagrams in, 55
  • Image height:
    • objects at infinity, 52
    • in paraxial raytracing, 38
  • Images:
    • evaluating (see Image evaluation)
    • forming (see Image formation)
    • illumination of, 151–154
    • orientation of, in prism systems, 99–100, 105–107
    • radiometry of, 225–230
  • Immersion lenses, 277–280
  • Immersion objectives, 447, 450–451
  • Index dispersion, 175–178
  • Index-slope angle products, 37–38
  • Indexes:
    • of eye surfaces, 127
    • of lenses in paraxial raytracing, 37–38
    • of prisms, 94
    • of refraction, 3–4
    • and dispersion, 178
    • importance of, 568
    • for mirrored surfaces, 43
    • test for, 592
  • Infinite conjugates, 251–252
  • Infinity, height for objects at, 52
  • Infinity f-numbers, 152–153
  • Infrared region, 1
  • Infrared transmitting glasses, 186–187
  • Instrument myopia, 135
  • Integrating spheres, 200, 247–248
  • Intensity:
    • in photometry, 240
    • in radiometry, 220–221
  • Intercept length for mirrored surfaces, 44
  • Interference, 11–16
  • Interference coatings, 207–208
  • Interference filters, 200–209
  • Interferometers, 558
  • Internal transmittance, 184
  • Intersection coordinates for skew rays, 313–314
  • Inverse Dall-Kirkham system, 481
  • Inverse square law, 220–221
  • Inversion prisms, 111–113
  • Inverting telescopes, 252
  • IR Cooke triplet, 543
  • IR telescope, 545
  • Iris, 126
  • Irradiance:
    • from diffuse sources, 223–225
    • in photometry, 240–242
    • in radiometry, 220
  • Iterative technique, 428

J[編集]

  • Johnson’s law, 376

K[編集]

  • K-mirrors, 113
  • Kettler-Drude dispersion equation, 176–177
  • Kinematic mounts, 575–576
  • Kinoforms, 296, 413
  • Knife-edge scans, 596
  • Knife-edge test, 588–592
  • Knife-edge traces, 362
  • Koenig prisms, 110–111

L[編集]

  • Lagrange invariant, 49–54
  • Lambertian diffusers, 195–196
  • Lamberts, 239
  • Lambert’s law, 221–222
  • Landolt broken ring test, 128
  • Laser ablation, 136–137
  • Laser beam diffraction, 163–168
  • Laser beam expanders, 255
  • Laser diodes, 291
  • Laser disk objectives, 547
  • Laser rangefinders, 274
  • Lateral aberrations, 64–66, 322, 358
  • Lateral magnification, 26
  • Laws of probability, 570
  • Leman prisms, 111–112
  • Lens bench collimators, 584
  • Lens benches, 580–581
  • Lens shape effect on aberrations, 73–77
  • Lenticular screens, 197
  • Licht-Sprechers, 97
  • Light pipes, 279–281
  • Light wave propagation, 2–5, 157–158
  • Line images, 289–290
  • Line spread functions, 361–362
  • Linear aberrations, 79
  • Linear blur, 154
  • Linear dimensions in computations, 302
  • Linear kinoform surfaces, 413
  • Linear resolution, 163
  • Long-pass transmission filters, 207
  • Longitudinal departure, 71
  • Longitudinal magnification, 27
  • Longitudinal spherical aberrations, 64–66, 322
  • Lord Rayleigh’s criterion, 161–162
  • Low-expansion glasses, 185–186
  • Low-index, broadband Cooke triplets, 512
  • Low-index glass, 527
  • Low-reflection coatings, 204–205
  • Luminous radiation, 237–243
  • リオストップ Lyot stops, 147

M[編集]

  • Magnetorheologic polishing, 558
  • Magnification, 26–27
    • in anamorphic systems, 287
    • in microscopes, 269–270
    • in telescopes, 251, 253–254
  • Magnifiers, 267–269, 285, 444–445
  • Maksutov system, 486–491
  • Mangin mirrors, 487–488, 493–494, 497
  • Manual aberration correction, 426–428
  • Marechal criterion, 357, 385, 387
  • 光学材料 Materials:
    • in design, 435
    • in optical manufacture, 549–550
    • specifications and tolerances for, 568–569
  • 行列光学 Matrix optics, 54–55
  • Measurements:
    • aberration, 66–67, 585–587
    • focal length, 581–584
    • modulation transfer function, 594–596
    • telescopic power, 585
  • Melt fits, 575
  • Meniscus forms:
    • camera lens, 395–401
    • in design, 436
    • focal points in, 41
    • inner crown, 529
    • for photographic objectives, 453–459
    • in residual aberrations, 429
  • Meridional rays and planes, 69, 304–308
  • Merit function, 432–434
  • Merte effect, 462
  • Merte surfaces, 460
  • Mesopic curve, 134
  • Microscopes and microscope objectives, 447–448
    • aplanatic surfaces in, 449–450
    • autocollimating, 584, 598
    • compound, 269–271
    • flat-field, 451–452
    • high-power, 450–451, 530
    • low-power, 448
    • medium-power, 448–449
    • Rayleigh limit in, 358
    • reflecting, 452–453
    • simple, 267–269
  • Millimicrons, 2–3
  • Minifiers, 285
  • Minimum deviation of prisms, 94
  • Mirrors:
    • ellipsoidal, 472–473, 477–484, 557
    • in image formation, 43–45
    • Mangin, 487–488, 493–494, 497
    • mounting, 580
    • plane, 116–117
    • semireflecting, 210
    • spherical, 474–476, 493, 497
  • Modified Amici prisms, 111–112
  • Modulation transfer function (MTF), 366–372
    • with coherent and semi-coherent illumination, 380–383
    • computation of, 372–376
    • diffraction-limited systems in, 376–383
    • measurement of, 594–596
  • Motion, magnification of, 27
  • Mounting techniques, 575–580
  • Multilayer coatings, 207–209

N[編集]

  • Narrow bandpass filters, 207
  • Natural stop positions, 76
  • Negative magnification, 27
  • Negative outer meniscus elements, 539
  • Newton’s black spot, 15
  • Newton’s rings, 14–15
  • Nicol prisms, 199
  • Night myopia, 135
  • Nodal slides, 581
  • Nonbrowning glasses, 183
  • ヌルレンズ Null lenses, 558

O[編集]

  • Offense against sine condition (OSC), 323
  • Oil-immersion microscopes, 450
  • Old Schott dispersion equation, 176–177
  • 1-diopter prisms, 126
  • Opal glass, 198, 200
  • Opening equations, 302, 304–305, 309, 319
  • Optic nerve, 127
  • Optical coatings, 201–209
  • Optical computations, 301–302
    • aberration, 321–327
    • Coddington’s equations, 317–321
    • general and skew rays:
    • aspheric surfaces, 312–317
    • spherical surfaces, 308–312
    • meridional rays, 304–308
    • paraxial rays, 302–304
  • 光学的密着 Optical contact method, 214
  • Optical devices, 251
    • anamorphic systems, 287–291
    • compound microscopes, 269–271
    • diffractive surfaces, 296–297
    • exit pupils, eyes, and resolution in, 257–267
    • fiber optics, 281–287
    • field lenses and relay systems, 255–257
    • radiometers and detector optics, 274–281
    • rangefinders, 271–274
    • simple microscopes and magnifiers, 267–269
    • telescopes, 251–255
    • variable-power systems, 291–296
  • Optical glass, 178–184
    • in Cooke triplets, 418, 422–424, 511
    • gradient index, 187
    • infrared transmitting, 186–187
    • low-expansion, 185–186
    • in meniscus anastigmats, 454, 457
    • in meniscus camera lenses, 395
    • in Petzval lenses, 467, 524
    • in telescope objectives, 402, 404–405, 410
  • Optical invariant, 49–54
  • Optical laboratory practice:
    • aberration measurement, 585–587
    • focal length measurement, 581–584
    • Foucault test, 588–592
    • lens benches, 580–581
    • modulation transfer function measurement, 594–596
    • resolution tests, 592–594
    • Schlieren test, 592
    • star test, 587–588
    • telescopic power measurement, 585
    • unknown optics analysis, 596–599
  • Optical manufacture:
    • blocking, 551–552
    • centering, 555–556
    • grinding, 552–554
    • high-speed processing, 556
    • materials, 549–550
    • nonspherical surfaces, 557–559
    • polishing, 554–555
    • rough shaping, 550–551
    • single-point diamond turning, 559
  • Optical path difference (OPD), 15, 79–80
    • for aberration measurements, 66–67
    • computations for, 326–327
    • focus shift in, 348–349
    • in ray intercept plots, 88–89
    • RMS, 355–356
    • spherical aberration in, 349–355
  • Optical path length, 15
  • Optical specifications and tolerances, 559–560
    • additive, 570–575
    • centering, 565–567
    • materials, 568–569
    • prism dimensions and angles, 567–568
    • surface accuracy, 560–564
    • surface quality, 560–561
    • thickness, 564–565
  • Optical systems, resolution of, 160–163
  • Optical systems design, 393–395
    • achromatic telescope objectives, 402–413
    • Cooke triplet anastigmats, 418–424
    • diffractive surfaces, 413–418
    • by electronic computer, 431–435
    • generalized design technique, 424–431
    • practical considerations in, 435–436
    • simple meniscus camera lens, 395–401
    • symmetrical principle in, 401
  • Optical transfer function (OTF), 372
  • Orders of aberrations, 83–89
  • Orientation in prism systems, 99–100, 105–107
  • Orthometar lenses, 455
  • Orthoscopic eyepieces, 442–443
  • OSC aberration computations, 323
  • Overcorrected astigmatism, 71
  • Overcorrected distortion, 72
  • Overcorrected spherical aberration, 65
  • Overspecification, 559

P[編集]

  • Paraboloidal mirrors:
    • blur size estimation in, 493
    • manufacturing, 557
    • in reflecting systems, 476–477
  • Paraxial rays:
    • computations for, 302–304
    • for mirrored surfaces, 43
    • through several surfaces, 34–38
    • in third-order aberrations, 329
  • Paraxial region, 22, 32–34
  • Path length in fiber optics, 282
  • Pattern-generating surfaces, 297
  • Peak-to-valley (P-V) OPD, 356
  • Peaking-up characteristics, 572–573
  • Pechan prisms, 112
  • Pellicles, 114–115
  • Penta prisms, 113–114
  • Pentac anastigmats, 460
  • Perfect optical systems, 22
  • Periscopes, 256–257, 401
  • Petzval curvature, 70–71
    • in Cooke triplets, 418, 422
    • in eyepieces, 440
    • manual correction of, 427
    • in meniscus camera lens, 395–396, 400
  • Petzval lenses:
    • for photographic objectives, 465–467
    • with split elements, 522, 524
  • Petzval sum, 420
  • Petzval surfaces, 71, 423
  • Phase shifts, 287, 379
  • Phase transfer function (PTF), 372
  • Photoelectric effect, 16–17
  • Photographic density of filters, 175
  • Photographic depth of focus, 156–157
  • Photographic objectives, 453
    • afocal attachments, 470
    • airspaced anastigmats, 459–464
    • meniscus anastigmats, 453–459
    • Petzval lenses, 465–467
    • reverse telephoto lenses, 468–470
    • telephoto lenses, 467–468
  • Photographic triplet lens, 342–345
  • Photometry, 219–220, 237–243
  • Photopic curve, 134
  • Pincushion distortion, 72, 440
  • Pipes, light, 279–280
  • Pitch in blocking, 551
  • Planck’s law, 232–235
  • Plane mirrors, 116–117
  • Plane parallel plates, 100–104
  • Plane surface reflections, 97–100
  • Plane waves, 2
  • Plasmat lenses, 455
  • Plastic cements, 214
  • Plastic fibers, 283–285
  • Plastic optical materials, 188–192
  • Plate glass, 183
  • Ploessl eyepieces, 443–444, 509
  • Point spread functions (PSFs), 361–362, 385–391
  • Polarizing materials, 197–200, 209
  • Polishing, 554–556, 558
  • Porro prisms, 109–110
  • Portrait lenses, 465
  • Position in image formation, 24–26
  • Power:
    • in anamorphic systems, 287, 289
    • in Cooke triplet anastigmats, 419–421
    • in design, 426
    • of field lenses, 261–262
    • of lenses, 24
    • of microscopes, 267–270
    • radiated into hemispheres, 222–223
    • of searchlights, 245
    • in telescopes, 251, 253, 259, 263–267, 585
    • of two-component systems, 47
  • Precision bevels, 436
  • Precision in computations, 301–302
  • Presbyopia, 137
  • Pressing, 549
  • Primary aberrations, 64
    • manual correction of, 426–428
    • point spread functions for, 385–391
  • Principal planes, 45–46
  • Principal points, 22, 39–42
  • Principal rays, 69, 142, 329
  • Prisms, 91
    • achromatic and direct vision, 94–96
    • in anamorphic systems, 287, 290–291
    • designing, 117–122
    • dimensions and angles for, 95, 567–568
    • diopter, 126
    • dispersing, 91–92
    • erecting systems for, 108–111
    • in eyepieces, 440
    • inversion, 111–113
    • minimum deviation of, 94
    • mounting, 580
    • Penta, 113–114
    • plane parallel plates in, 100–104
    • polarizing, 199
    • in rangefinders, 272–273
    • reflection from plane surfaces in, 97–100
    • rhomboids and beam splitters, 114–116
    • right-angle, 104–107
    • roof, 107–108
    • thin, 92–94
    • total internal reflection in, 96–97
    • wave fronts affected by, 8–11
  • Projection screens, 195–198
  • Projection TV objectives, 542
  • Protars, 454
  • Protected glasses, 183
  • Pulfrich refractometers, 598
  • 瞳 (光学) Pupils:
    • and aperture stop, 142–143
    • eye, 126
    • in magnifiers, 444
    • in optical devices, 257–267
    • in telescopes, 254, 260
    • zones of, 588–589
  • Purkinje shift, 134
  • Purple optical glass filters, 194

R[編集]

  • R-Biotars, 525
  • Radial energy distribution, 383–385
  • Radial gradients, 187
  • Radial test targets, 593
  • Radiant intensity, 240
  • Radiation:
    • blackbody, 231–237
    • glasses for, 183
    • into hemispheres, 222–223
    • reducing, 148–150
  • Radiometers, 274–281
  • Radiometry and radiance, 219–220
    • blackbody radiation, 231–237
    • conservation of, 225–230
    • and diffuse sources, 223–225
    • and hemispheres, 222–223
    • of images, 225–230
    • inverse square law for, 220–221
    • and Lambert’s law, 221–222
    • spectral, 230–231
  • Radius in unknown optics analysis, 597
  • Ramsden eyepieces, 441–442
  • Rangefinders, 271–274
  • Rapid estimation of blur size, 491–496
  • Rare earth glasses, 179, 183, 423
  • Ray heights in raytracing, 37–38
  • Ray refraction at single surface, 30–32
  • Ray slope-index product, 319
  • Rayleigh limit (RL), 355–357
  • Rayleigh’s criterion, 161–162
  • Rays, 4
    • intercept curves for, 65, 83–89
    • through lenses, 10
    • meridional, 69, 304–308
    • paraxial (see Paraxial rays)
  • Raytracing:
    • in aberration measurements, 585
    • computer effects on, 394
    • graphical, 306–307
    • in optical computations, 302
    • through several surfaces, 34–38
    • for spot diagrams, 360–361
  • Real angular field of view, 253
  • Real images, 10
  • Rear meniscus camera lens, 400, 434
  • Rear projection screens, 198
  • Reciprocal relative dispersion, 93–94, 178
  • Red optical glass filters, 194
  • Reduction of residual aberrations, 429–430
  • Reflectance levels of natural sources, 239–240
  • Reflecting microscope objectives, 452–453
  • Reflecting systems, 474
    • Bouwers system, 488–491
    • conic sections through origins in, 484–485
    • ellipsoid and hyperboloid, 477–484
    • Mangin mirrors, 487–488
    • paraboloidal reflectors in, 476–477
    • Schmidt system, 485–487
    • spherical mirrors in, 474–476
  • Reflection, 173–175
    • dielectric, 200–209
    • in fiber optics, 282
    • with immersion lenses, 278
    • in prisms, 96–100
  • Reflectors, 117–122, 209–211
  • Refracting prisms, 290–291
  • Refraction:
    • equations for, 302, 305, 309
    • law of, 5–8
    • at single surface, 30–32
    • for skew rays, 315–317
  • Regions of solution, 427–428
  • Reinforced waves, 14
  • Relative apertures, 152
  • Relative dispersion, 7, 178
  • Relay systems, 256–257
  • Replication, plastics for, 191
  • Residual aberrations, 80–83, 429–430, 462
  • Resistance of optical glass, 181
  • Resolution:
    • of compound microscopes, 270–271
    • in diffraction-limited systems, 379
    • of eyes, 258
    • in fiber optics, 283
    • in modulation transfer function, 367–368, 376
    • in optical devices, 257–267
    • of optical systems, 160–163
    • tests for, 592–594
  • Reticles, 211–213
  • Retina, 127–128
  • Retrofocus lenses, 468–470, 513
  • Reverse telephoto lenses, 468–470, 513
  • Reversed Tessars, 519
  • Rhomboid prisms, 114–116
  • Right-angle prisms, 104–107
  • Ritchey-Chretien objective, 479–480
  • RMS (root-mean square) OPD, 355–356
  • Rod-lens endoscopes, 257
  • Rods, 127–128
  • Ronchi grating tests, 557
  • Roof prisms, 107–108, 112
  • Rough shaping, 550–551

S[編集]

  • Sagittal coma, 69, 103, 323
  • Sagittal curvature of field, 317
  • Sagittal height, 16
  • Scaling of aberrations, 79
  • Scheimpflug condition, 55–57
  • Schlieren test, 592
  • Schmidt cameras, 333
  • Schmidt prisms, 111–112
  • Schmidt systems:
    • blur size estimation in, 493, 498
    • Cassegrains, 487
    • in reflecting systems, 485–487
  • Schwarzchild configuration, 452
  • Scotopic curve, 134
  • Scratch and dig specifications, 436
  • Searchlights, 243–247
  • Second-surface mirrors, 116–117
  • Secondary spectrum (SS), 82
    • in achromatic telescope objectives, 409–410
    • in diffractive surface design, 416
  • Seidel aberrations, 62–72
  • Seidel coefficients, 331
  • SELFOC rods, 285
  • →分散公式 en:Sellmeier equation Sellmeier dispersion equation, 176–177
  • Semi-coherent illumination, MTF with, 380–383
  • Semireflecting mirrors, 210
  • Sensitivity of eyes, 131–134
  • Separated component systems, 45–49
  • Seventh-order aberrations, 88
  • Sheet polarizers, 199
  • Short-pass transmission filters, 207
  • Sigmoidoscopes, 284
  • Sign conventions, 25, 30–31, 57–58
    • for mirrored surfaces, 43
    • for telescopes, 253
  • Simple lenses:
    • blur size estimation in, 494
    • meniscus camera, 395–401
    • wave fronts affected by, 8–11
  • Simple microscopes, 267–269
  • Simultaneous design techniques, 432
  • Sine wave response, 369
  • Sine-wave targets in MTF, 375–376
  • Single-lens elements, blur size estimation in, 499
  • Single-lens reflex (SLR) cameras, 274
  • Single-material catadioptric systems, 533
  • Single-point diamond turning, 414, 483, 559
  • Single refracting elements, blur size estimation in, 498
  • Single surface, ray refraction at, 30–32
  • Singlet correctors, 531
  • Size in image formation, 26–30
  • Skew rays, 69
    • aspheric surface computations, 312–317
    • spherical surface computations, 308–312
  • Slits in MTF tests, 594–596
  • Slope angles in paraxial raytracing, 38
  • Snell’s law of refraction, 5–8
  • Sonnar anastigmats, 456, 528
  • Spacing:
    • in Cooke triplet anastigmats, 419–421
    • in design, 426
    • in microscope objectives, 452
    • in telescopes, 263–265
    • in unknown optics analysis, 597
  • Sparrow’s criterion, 160
  • Spatial filtering, 168
  • Special glasses:
    • gradient index, 187
    • infrared transmitting, 186–187
    • low-expansion, 185–186
  • Spectral radiometry, 230–231
  • Speed of systems, 152
  • Spheres, integrating, 247–248
  • Spherical aberration, 64–67
    • in anastigmats, 424, 458, 461
    • in blur, 364–365, 492
    • computations for, 322
    • in condenser systems, 472
    • in Cooke triplets, 421–422
    • in diffraction-limited systems, 379–381
    • in diffractive surface design, 416
    • in eyepieces, 440
    • fifth-order, 352–354
    • geometric spot size due to, 362–366
    • and lens shape, 75
    • manual correction of, 427
    • in meniscus camera lens, 395, 399
    • in optical path difference, 349–355
    • in Petzval lenses, 467
    • in plane parallel plates, 103
    • in point spread functions, 386–387, 390–391
    • Rayleigh limit in, 358
    • in reflecting systems, 474–476, 479–480
    • in telescope objectives, 402, 405–409
    • third-order, 335, 351–352
    • wave aberration polynomial for, 354–355
  • Spherical gradients, 187
  • Spherical mirrors, 474–476, 493, 497
  • Spherical reflectors, 473
  • Spherical surfaces, general and skew rays on, 308–312
  • Spherical test plates, 561
  • Spherochromatism, 82
    • computations for, 325
    • in diffractive surface design, 416
    • in residual aberrations, 429
    • in telescope objectives, 406–409
  • Spherometers, 597
  • Spike filters, 207
  • Spinning shoulders, 578
  • Split elements, 462–463
  • Split-front triplets, 526, 529
  • Split-image rangefinders, 274
  • Split-rear crown double Gauss, 536
  • Spot diagrams, 360–361
  • Spot size due to spherical aberration, 362–366
  • Spread functions, 361–362
  • Spreading of gaussian beams, 165–166
  • Sprenger prisms, 112
  • Spurious resolution, 379
  • Square-wave targets in MTF, 375–376
  • Star test, 587–588
  • Statistical combination, 570
  • Stefan-Boltzmann law, 232, 235
  • Steinheil form, 405
  • Steradians, 220
  • Stereo vision, 131
  • Stokes lenses, 289
  • Stop shift equations, 335–345
  • Stops (see Apertures)
  • Stray radiation, 148–150
  • Strehl definition, 368
  • Strehl ratio, 356–359, 385
  • Styrene plastic, 191
  • Subtended angles, 251, 253, 268
  • Superachromat lenses, 411
  • Surface curvature in eye, 127
  • Surfaces:
    • diffractive, 296–297
    • specifications and tolerances for, 560–564
    • in third-order aberration computations, 328–335
  • Surveying instruments, 258, 446
  • Sweatt model, 414–415
  • Symmetrical eyepieces, 443–444, 509
  • Symmetrical principle, 401
  • Synthesis of optical systems (see Optical systems design)
  • Systems of separated components, 45–49

T[編集]

  • T-stops, 153
  • Tangential coma, 69, 322–323, 358, 417
  • Tangential curvature of field, 317
  • Tangential images, 69
  • Tangential rays and planes, 69
  • Targets in MTF, 366–367, 375–376
  • Telecentric stops, 150–151
  • Telephoto lenses, 467–468, 515
  • Telephoto ratio, 467
  • Telescope systems and eyepieces, 251–255, 439–441, 508
    • brightness in, 247
    • diopter adjustment of, 445
    • erector systems, 445
    • Erfle eyepieces, 444
    • Huygenian eyepieces, 441
    • Kellner eyepieces, 442
    • magnification, 52
    • magnifiers, 444–445
    • objective systems in, 252, 254, 402–413, 445–447
    • orthoscopic eyepieces, 442–443
    • power measurements, 251, 253, 259, 263–267, 585
    • Ramsden eyepieces, 441–442
    • Rayleigh limit in, 358
    • symmetrical eyepieces, 443–444
  • Temperature:
    • in blackbody radiation, 232, 234
    • and telescope objectives, 412
  • Terrestrial telescopes, 252
  • Tessar anastigmats, 459, 518
  • Test plates, 561, 574
  • Theodolites, 446
  • Thick lenses:
    • in Cooke triplets, 422
    • in design, 435–436
  • Thickness, 564–565
    • apparent, 29
    • of filters, 194
    • magnification of, 27
    • in paraxial raytracing, 37–38
    • in unknown optics analysis, 597
  • Thickness fits, 575
  • Thin elements, 435
  • Thin-edged elements, 435
  • Thin-film computations, 205–209
  • Thin lenses:
    • aberration expressions, 428
    • blur size estimation in, 494, 500
    • in image formation, 42–43
    • stop shift equations, 335–345
    • for telescope objectives, 402–404
  • Thin prisms, 92–94
  • Third-order aberrations, 64, 88, 351–352
    • in Cooke triplets, 422
    • in diffraction-limited systems, 379–381
    • in geometric spot size, 362–363
    • in meniscus camera lenses, 396–398
    • Rayleigh limit in, 358
    • in reflecting systems, 479–480
    • in residual aberrations, 429
    • surface contribution in, 328–335
    • thin lenses, 335–345
  • Third-order theory, 88
  • 35-mm camera objectives, 535
  • Three-dimensional vision, 131
  • Three-hole masks, 585–586
  • Topogon lens, 454
  • Toroids, 557
  • Total curvature of thin lenses, 42
  • Total emissivity, 235–236
  • Total internal reflection (TIR), 96–97, 283–284
  • Transfer equations, 302–303, 305, 309, 311
  • Transformation temperature in glass, 181
  • Transmission:
    • calculations for, 174–175
    • in radiance of images, 226
  • Transmitting diffusers, 197–198
  • Transverse aberrations, 64–66, 322, 358
  • Transverse magnification, 26
  • Triangulation rangefinders, 271
  • Trigonometric correction, 428–429
  • Trigonometric functions, 301–302
  • Triplet achromats, 410
  • Triplets:
    • with aspheric field correctors, 541
    • Cooke (see Cooke triplet anastigmats)
  • Truncation, beam, 166
  • Tunnel diagrams, 105
  • Twisting in lens mounting, 579
  • Two-component systems, 47–49

U[編集]

  • Undercorrected astigmatism, 70
  • Undercorrected spherical aberrations, 65
  • Underspecification, 559–560
  • Unfolding prisms, 104–105
  • Unknown optics analysis, 596–599
  • USAF1951 resolution test target, 593

V[編集]

  • V-number, 94, 178–179, 183
  • Variable-power systems, 291–296
  • Velocity of propagation, 3
  • Vernier acuity, 131
  • Vertex length, 424, 456
  • Viewer lenses, 444–445
  • Vignetting, 143–147
  • Virtual images, 10
  • Visible spectrum, 1
  • Visual acuity, 128–130
  • Visual centering, 555
  • Visual resolution of microscopes, 270–271
  • Vitreous humor, 126

W[編集]

  • Waists, 165–168
  • Warping in lens mounting, 579
  • Watts, 219
  • Wave aberration polynomial, 354–355
  • Wave fronts:
    • aberration, 79–80, 88–89, 326–327
    • simple lens and prism affects on, 8–11
  • Wavelength, 1–3
    • in blackbody radiation, 232–234
    • and dispersion, 176
    • and emissivity, 236
    • and eye sensitivity, 133–134
    • in fiber optics, 287
    • in radiometry, 219
  • Wide-angle design, 539
  • Wide-angle lenses, 154
  • Wide-angle photography, 455
  • Widely airspaced doublets, 411
  • Wien’s displacement law, 232, 235
  • Wind-tunnel applications, 592
  • Window glass, 183
  • Wood lenses, 286
  • Working f-numbers, 152
  • Wratten filters, 193

Y[編集]

  • Y-ybar diagrams, 55
  • Ynu raytraces, 34

Z[編集]

  • Zeiss Protars, 454
  • Zero-power meniscus elements, 429
  • Zonal aberrations, 81
    • in anastigmats, 424
    • computations for, 322
    • in diffractive surface design, 416
    • with point spread functions, 390
    • Rayleigh limit in, 358
    • in residual aberrations, 429
    • in telescope objectives, 407–409
  • Zones of pupils, 588–589
  • Zoom systems, 291–296

その他[編集]

出典となる書籍[編集]

[1] [2] [3] [4] [5] [6] [7]

  1. ^ Smith, Warren J. (2000-07-26). Modern Optical Engineering: The Design of Optical Systems (3rd Ed. ed.). McGraw-Hill. ISBN 978-0071363600 
  2. ^ 吉田正太郎『レンズとプリズム』（第1版）地人書館、東京都新宿区中町15番地、1985年6月10日。 
  3. ^ ヴィリー・チョムラー 著、浅野俊雄 訳『レンズ・プリズムの精密加工　光学工場必修技術』（第2版）恒星社厚生閣、東京都新宿区三栄町8番地、1973年10月25日。 
  4. ^ 永田信一『図解　レンズが分かる本』（初版）日本実業出版社、東京都文京区本郷3-2-12、2002年11月20日。ISBN 978-4-534-03491-5。 
  5. ^ 牛山善太『波動光学エンジニアリングの基礎』（第1版）オプトロニクス社、東京都新宿区新小川町5-5サンケンビル、2005年3月31日。ISBN 4-902312-09-3。 
  6. ^ 辻　定彦『レンズ設計のすべて』（第1版）電波新聞社、東京都品川区東五反田1-11-15、2006年9月10日。ISBN 978-4885549212。 
  7. ^ 松居　吉哉『結像光学入門』啓学出版、1988年6月。ISBN 978-4766506013。 
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